| | 2 | |
| | 3 | == Notes: == |
| | 4 | |
| | 5 | **Present*: KL, HTL |
| | 6 | |
| | 7 | 1. Notes and actions from [wiki:Research/Instrumentation/Meetings/2019/09-13 last meeting]: |
| | 8 | * **KL**: Liaise to develop concept for polishing. |
| | 9 | * **Ongoing**. |
| | 10 | * **KL**: Define light exclusion scheme for 527. |
| | 11 | * **Done**. Progress since last week: occupants of offices beyond the 527 lab informed and on-board with need to exclude short-wavelength light. OK now to plan to do the "yellow out". Specification of material sourced by AK passed on to KL. |
| | 12 | * **AK**: Prepare paperwork necessary to gain permission to work with source in 527. |
| | 13 | * **Ongoing.** |
| | 14 | * **AK**: Pass details of second laptop to KL so that delivery can be followed in AK's absense. |
| | 15 | * **Superceded**. Laptop has now arrived. LabView installed (i.e. Licences are valid). |
| | 16 | |
| | 17 | 2. Baseline schedule and progress against schedule: KL/HTL \\ |
| | 18 | * [raw-attachment:2019-08-21-SmartPhantom.pdf Progress against baseline schedule]. |
| | 19 | |
| | 20 | 3. Mechanical design/manufacture update: JT for LC \\ |
| | 21 | * Winding jig is complete at RAL and will be shipped to imperial. Photograph of assembled jig is shown below. |
| | 22 | |
| | 23 | 4. Control system and SciWire readout update: AK \\ |
| | 24 | * No report this week as AK is on leave. Item left for future reference. |
| | 25 | |
| | 26 | 5. Simulation/analysis update: HTL \\ |
| | 27 | * [raw-attachment:meeting.pdf Material/Glue Simulation Update]. |
| | 28 | * Variation with film material (mylar, kevlar, and kapton) and depth of epoxy studied. Variation is small. So we **accept** specification adopted in discussion on 15Aug19: 100 micron mylar sheet and 200 micron depth of epoxy. |
| | 29 | |
| | 30 | 6. Next steps \\ |
| | 31 | * Move to test winding. |
| | 32 | |
| | 33 | 7. DONM \\ |
| | 34 | * 28Aug19 |
| | 35 | |
| | 36 | 8. AoB \\ |
| | 37 | |
| | 38 | === Summary of actions: === |
| | 39 | * **KL**: Liaise to develop concept for polishing. |
| | 40 | * **AK**: Prepare paperwork necessary to gain permission to work with source in 527. |
| | 41 | |
| | 42 | ---- |
